VABISHCHEVICH, S.; VABISHCHEVICH, N.; BRINKEVICH, D.; PROSOLOVICH, V.; KOLOS, V.; ZUBOVA, O. STRENGTH PROPERTIES OF PHOTORESISTS FOR EXPLOSIVE LITHOGRAPHY. Vestnik of Polotsk State University. Part C. Fundamental Sciences, [S. l.], n. 4, p. 49-55, 2022. DOI: 10.52928/2070-1624-2022-38-4-49-55. Disponível em: https://journals.psu.by/fundamental/article/view/1410. Acesso em: 3 jul. 2024.