STUDY OF STRENGTH PROPERTIES OF PHOTORESIST FILMS ON SILICON BY THE SCRATCHING METHOD
Article Sidebar
Main Article Content
Abstract
The strength properties of the structures of the photoresist-silicon was investigated by indenting and scratching methods. Film positive photoresist with thickness of 1.0–5.0 μm was deposited on silicon wafers of various brands by the centrifugation method. It was found that the microhardness as determined by sclerometer, 20–40 % more than microhardness obtained by the microindentation methods. When using the load, which equals 1–2 g, more accurate values of microhardness gives the scratching method. Increasing the load to 10 or more grams leads to a leveling of the specified differences – values of microhardness obtained by both methods coincide.
Article Details
This work is licensed under a Creative Commons Attribution 4.0 International License.
References
Моро, У. Микролитография. Принципы, методы, материалы : в 2 ч. / У. Моро. – М. : Мир, 1990. – Ч. 2. – 632 с.
Наконечники и бойки алмазные к приборам для измерения твердых металлов и сплавов. Технические условия : ГОСТ 9377-81. – М. : Изд-во стандартов, 1981. – 10 с.
Измерение микротвердости царапанием алмазными наконечниками : ГОСТ 21318-75. – введ. 01.07.76 г. – М. : Изд-во стандартов, 1976. – 30 с.
Бринкевич, Д.И. Микромеханические свойства эпитаксиальных слоев GaP, легированных редкоземельным элементом диспрозием / Д.И. Бринкевич, Н.В. Вабищевич, В.С. Просолович // Неорганические материалы. – 2012. – Т. 48, № 8. – С. 878–883.
Измерение микротвердости вдавливанием алмазных наконечников : ГОСТ 9450-76. – введ. 01.01.77 г. : с изм. – М. : Изд-во стандартов, 1993. – 35 с.
Most read articles by the same author(s)
- S. VABISHCHEVICH, N. VABISHCHEVICH, D. BRINKEVICH, V. PROSOLOVICH, INTERACTION OF THE INDENTOR WITH FILMS OF COPOLYMERS ON THE BASIS OF METHYLMETHACRYLATE, Vestnik of Polotsk State University. Part C. Fundamental Sciences: No. 4 (2016)
- D. BRINKEVICH, V. PROSOLOVICH, V. KOLOS, O. ZUBOVA, S. VABISHCHEVICH, INFRARED FOURIER SPECTROSCOPY OF DIFFUSE REFLECTION OF THE AZ nLOF SERIES NEGATIVE PHOTORESISTS FILMS ON MONOCRYSTALLINE SILICON, Vestnik of Polotsk State University. Part C. Fundamental Sciences: No. 2 (2024)
- S. VABISHCHEVICH, N. VABISHCHEVICH, D. BRINKEVICH, V. PROSOLOVICH, FILMS OF POSITIVE DIAZOQUINONE-NOVOLAC PHOTORESIST FP9120 IMPLANTED WITH SILVER IONS, Vestnik of Polotsk State University. Part C. Fundamental Sciences: No. 2 (2023)
- D. BRINKEVICH, M. LUKASHEVICH, V. PROSOLOVICH, A. KHARCHENKO, S. VABISHCHEVICH, N. VABISHCHEVICH, MICROHARDNESS OF POLYIMIDE AND POLYETHYLENE TEREPHTHALATE FILMS IRRADIATED WITH 60Co GAMMA QUANTA, Vestnik of Polotsk State University. Part C. Fundamental Sciences: No. 12 (2017)
- V. GOLOVCHUK, A. KHARCHENKO, D. BRINKEVICH, M. LUKASHEVICH, S. VABISHCHEVICH, N. VABISHCHEVICH, STRUCTURAL AND OPTICAL CHARACTERISTICS OF CARBON-CONTAINING SILICATE GLASS IMPLANTED BY COPPER IONS, Vestnik of Polotsk State University. Part C. Fundamental Sciences: No. 12 (2017)
- S. VABISHCHEVICH, N. VABISHCHEVICH, D. BRINKEVICH, V. PROSOLOVICH, Y. YANKOVSKI, S. BRINKEVICH, STRENGTH PROPERTIES OF PHOTORESIST-SILICON STRUCTURES, Γ-IRRADIATED AND IMPLANTED BY B+ AND P+ IONS, Vestnik of Polotsk State University. Part C. Fundamental Sciences: No. 12 (2016)
- S. VABISHCHEVICH, N. VABISHCHEVICH, D. BRINKEVICH, V. PROSOLOVICH, STRENGTH PROPERTIES OF DIAZOQUINONE PHOTORESIST FP9120 FILMS ON MONOCRYSTALLINE SILICON IMPLANTED WITH ANTIMONY IONS, Vestnik of Polotsk State University. Part C. Fundamental Sciences: No. 2 (2024)
- A. VASUKOV, S. VABISHCHEVICH, V. KRISHTOPA, SCANNING SURFACES SOLID STRUCTURES AND OIL-WAIST VAR SYSTEMS BY ATOMIC FORCE MICROSCOPY, Vestnik of Polotsk State University. Part C. Fundamental Sciences: No. 4 (2017)
- S. DOBROVOLSKI, A. SAVKOV, D. BRINKEVICH, S. BRINKEVICH, N. VABISHCHEVICH, IMPURITY RADIONUCLIDES AT A RADIOPHARMACEUTICAL PRODUCTION BASED ON A 18F, Vestnik of Polotsk State University. Part C. Fundamental Sciences: No. 4 (2017)
- S. VABISHCHEVICH, N. VABISHCHEVICH, D. BRINKEVICH, A. KHARCHENKO, M. LUKASHEVICH, V. PROSOLOVICH, S. BRINKEVICH, REFLECTION SPECTRA OF Γ-IRRADIATED FILMS OF DIAZOQUINONE-NOVOLAK PHOTORESIST, Vestnik of Polotsk State University. Part C. Fundamental Sciences: No. 4 (2017)