COATINGS FORMATION BY ION BEAM SPUTTERING OF DIELECTRIC TARGETS
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Abstract
Features of a sputtering of dielectric targets by beams of the accelerated ions are viewed. It is shown, that an accelerating voltage on the anode, a discharge current, power of discharge and a compensator current – the major factors influencing deposition rate of films. The magnification of a discharge current result ins to decrease in breakdown strength and inductivity magnification. It is positioned, that the compensator current inappreciablly influences quantity of inductivity, at the same time loss angle essentially depends on this current. The magnification of a current of the compensator and pinch of energy of sputtering ions cause magnification of breakdown strength of films. The received coats have shown a high transparency in visible and short-range infrared bands that testifies to high density of their structure. Modes of the ion source for reception of films with the best parametres are spotted.
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