SURFACE MODIFICATION OF POSITIVE PHOTORESIST BY ION IMPLANTATION
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Abstract
By atomic force microscopy it was experimentally shown that cone-shaped structures are formed on the surface of positive photoresist FP9120 in the process of ion implantation. These structures are uniformly distributed over the surface of the photoresist. The height, diameter at base and the distribution density of these structures dependы on the irradiation conditions and the type of the implanted ions. The changes of the surface morphology of the photoresist observed in the implantation are due to the relaxation of stresses generated during the manufacture of the polymer film, and radiation-chemical processes in the surface layer of the photoresist.
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References
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